Module Catalogues, Xi'an Jiaotong-Liverpool University   
Module Code: EEE332
Module Title: Micro and Nanomanufacturing Technology
Module Level: Level 3
Module Credits: 5.00
Academic Year: 2020/21
Semester: SEM2
Originating Department: Electrical and Electronic Engineering
Pre-requisites: EEE201EEE337
This module aims to familiarise students with some basic concepts of the basic processes for micro/nano manufacturing technology and to prepare students for entering the micro/nano electronic industry.
Learning outcomes 
A. Gain knowledge of micro & nanofabrication facility in a clean room.

B. Understand micro & nanofabrication technology and theoretical underpinning.

C. Understand micro & nanofabrication processes.

D. Use commercial micro & nanofabrication facility to design and fabricate materials, devices, and circuits at the micro and nanoscale.

E. Show experience and enhancement of the following key skills: independent learning, team work, and time management.

Method of teaching and learning 
The module is taught through formal lectures, class tutorials and laboratory experiments.

Introduction Lecture: Course Introduction and Introduction to Micro and Nanofabrication Technology.


--Clean Room Lecture: Clean Room Concept and Basic Silicon Wafer Process.

--Laboratory1: Introduction to MNFF (Micro & Nano Fabrication Facility) at XJTLU and safety training.


--Standard Cleaning Lecture: Standard Cleaning Concept: ID water, H2O2, HF Dip, H2SO4, HCl, HN4OH, SC-1, SC-2, and IPA, etc.
--Laboratory2: Wafer standard cleaning and thermal oxidation.


--Thin Film Formation Lecture: Thin Film Formation and Metallization: thermal oxidation, CVD and PVD.

--Laboratory3: Photolithography, SiO2 etching, Si PN junction formation and 4-point probe measurement.


--Thin Film Characteristics Lecture: Thin Film Characteristics: I-V, C-V, XRD, AFM, TEM, etc.

--Laboratory4: ALD oxide deposition, rapid thermal annealing, PVD Al deposition, forming gas annealing, and Si MOS capacitor IV&CV measurement.


--Optical Lithography and Etching Lecture: Photolithography and Etching: coating, baking, exposure, developing, etching.

--Laboratory5: LPCVD graphene deposition and transfer, XRD or Raman characterization.


--Doping Lecture: Diffusion, Implantation and RTA.

--Laboratory6: Fabrication of nMOS ICs or thin film solar cells (I).


--Process Integration (I) Lecture: Semiconductor Device Technology.

--Laboratory7: Fabrication of nMOS ICs or thin film solar cells (II).


--Process Integration (II) Lecture: MEMS Technology.

--Laboratory8: Fabrication of nMOS ICs or thin film solar cells (III).


--Nanofabrication of Semiconductor Devices (I) Lecture: Nanofabrication using soft lithography.

--Laboratory9: Fabrication of nMOS ICs or thin film solar cells (IV).


--Nanofabrication of Semiconductor Devices (II) Lecture: Nanofabrication using manipulative techniques.

--Laboratory10: Thin film solar cells measurement or nMOS ICs test.


--Nanofabrication of Semiconductor Devices (III) Lecture: Nanofabrication using carbon nanomaterials.


--Nanofabrication of Semiconductor Devices (IV) Lecture: Future Development of Nano Technologies.

Delivery Hours  
Lectures Seminars Tutorials Lab/Prcaticals Fieldwork / Placement Other(Private study) Total
Hours/Semester 13    13  60    64  150 


Sequence Method % of Final Mark
1 Safety Training At Mnft 10.00
2 Pn Junctions Formation 20.00
3 Mos Capacitors Formation 20.00
4 Fabrication Of Thin Film Solar Cells Or Nmos Ics And A Review Of Nano Tech. 50.00

Module Catalogue generated from SITS CUT-OFF: 6/5/2020 8:52:35 PM